| 학회 | 한국공업화학회 |
| 학술대회 | 2021년 가을 (11/03 ~ 11/05, 대구 엑스코(EXCO)) |
| 권호 | 25권 2호 |
| 발표분야 | 포스터-나노 |
| 제목 | New patterning technology of highly accurate and uniform high-curvature structures on flexible polymer substrate |
| 초록 | Fabrication processes for high-curvature structures with spheres, elliptical shapes have been researched worldwide for application in various fields such as micro-lens arrays, anti-reflective lens, and superhydrophobic materials. Numerous technologies like thermal reflow, MEMS based lithography have been introduced for fabrication of high-curvature structures. However, thermal reflow is not suitable for fabricating a uniform pattern because it is difficult to control the contact angle. Also, MEMS based lithography has complex procedures, and as the pattern size decreases, it faces the limitation of wet etching. We have developed a new process to fabricate a micro-pattern with high-curvature using volume expansion of a gas. Also, we found that pattern size and shape are correlated with process conditions and material properties. This process is simple, inexpensive, and possible for large area. In the future, our method will broaden academic/industrial scope of optics and materials. |
| 저자 | 오상아, 전환진 |
| 소속 | 한국산업기술대 |
| 키워드 | micro-concave pattern; micro-lens array |
