| 학회 |
한국공업화학회 |
| 학술대회 |
2010년 가을 (10/27 ~ 10/29, 대전컨벤션센터) |
| 권호 |
14권 2호 |
| 발표분야 |
우수논문(구두) |
| 제목 |
Preparation of Degradable Branched Polymers for ArF Photoresist via Reversible Addition-Fragmentation Chain Transfer (RAFT) Polymerization |
| 초록 |
In this study, we prepared branched polymers as ArF photoresist via reversible addition-fragmentation chain transfer (RAFT) polymerization. Three monomers were copolymerized with an acid-cleavable crosslinker, 2,5-dimethyl-2,5-hexanediol dimethacrylate. The degree of branching was controlled by the ratio of crosslinker to CTA, and the size of primary chain was controlled by the ratio of monomer to CTA. After the acid-hydrolysis, the branched polymers were turned to linear polymers with low PDI, as confirmed by GPC. The studies on the effects of the change of structure and the reduction of molecular weight on lithographic performance are proceeding. |
| 저자 |
손해성1, 김동균1, 이애리1, 김정식2, 이재우2, 김재현2, 이종찬1
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| 소속 |
1서울대, 2동진쎄미켐 |
| 키워드 |
ArF photoresist; RAFT; branched polymer; acid-cleavable crosslinker
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| E-Mail |
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