| 초록 |
Block copolymer thin film is used in semiconductor lithography. When homopolymer A has similar molecular weight to that of A block in A-B diblock copolymer, the homopolymer A can solubilize into the A block in A-B diblock copolymer and localize in the middle of the domain A in lamellar A-B structure. Blending homo PS, homo PMMA and PS-b-PMMA diblock and spin coating the blend onto the substrate, and then removing homo PS and homo PMMA with selective solvent can reduce D by half compared to that of neat PS-b-PMMA diblock copolymer, which can lead to higher degree of integration. |
