| 학회 |
한국고분자학회 |
| 학술대회 |
2012년 가을 (10/11 ~ 10/12, 창원컨벤션센터) |
| 권호 |
37권 2호 |
| 발표분야 |
고분자구조 및 물성 |
| 제목 |
Line Patterns of Block copolymers with Large Periods Exceeding 100 nm |
| 초록 |
Block copolymer nanostructures with large periods exceeding 100 nm remains challenging, because the translational ordering of long-chained block copolymer is hindered by its very low chain mobility. Here, rapid evolution of a perpendicularly oriented lamellar morphology in high-molecular-weight block copolymer films on a neutral substrate is demonstrated using a neutral-solvent-vapor annealing process, which was sequentially combined with a thermal annealing process. The great synergy with the topographically patterned substrate facilitated unidirectionally structural development of ultrahigh-molecular-weight block copolymer thin films—even for the structures with a large period of 200 nm—leading to perfectly guided, parallel, and highly ordered line-arrays of perpendicularly oriented lamellae in the trenches. |
| 저자 |
김은혜1, 류두열2, 박성민2, 안형주2, 이문규3, 이수미3, 김태우3, 이준한3, Xie Lei3, 허준2, 방준하4, 이병두5, 한영수6
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| 소속 |
1한국원자력(연), 2연세대, 3삼성디스플레이, 4고려대, 5Advanced Photon Source, 6Argonne National Laboratory |
| 키워드 |
Block Copolymers; Large Periods; Solvent annealing
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| E-Mail |
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