| 학회 |
한국고분자학회 |
| 학술대회 |
2008년 봄 (04/10 ~ 04/11, 컨벤션 뷰로(대전)) |
| 권호 |
33권 1호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Enhancement of Mechanical Properties of Nanoporous Ultralow Dielectrics by Ozone Treatment |
| 초록 |
One of the most promising ultralow dielectric materials for the next generation semiconductors is nanoporous organosilicates because their dielectric constant could be decreased below 2 by introducing more voids (k=1). However, introducing large number of voids could cause dramatic decrease of mechanical properties such as elastic modulus and surface hardness of the film. To solve this drawback, we used the ozone treatment of the film which increased the number of silanol groups by transforming the alkoxy groups in the film to -OH groups. The increased number of silanol groups in the film is expected to make more Si-O-Si network structure and it will increase the mechanical properties. Films with different porosity were prepared and the effects of the ozone treatment on the film were investigated. Morphological and mechanical properties were examined by various techniques. The ozone treatment resulted in much higher mechanical properties of ultralow dielectrics than their counterparts |
| 저자 |
최현상, 박건우, 이용준, 이희우
|
| 소속 |
서강대 |
| 키워드 |
low dielectric; ozone treatment
|
| E-Mail |
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