화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2012년 봄 (04/12 ~ 04/13, 대전컨벤션센터)
권호 37권 1호
발표분야 고분자가공/복합재료
제목 Use of Weak Acids to Prepare Periodic Mesoporous Organosilica
초록 We present the effect of weak acids on the formation of 2D p6mm hexagonal and 3D Im3m benzene-silica mesoporous materials by employing 1,4-bis(triethoxysilyl)benzene (BTEB) organosilane and P123 and F127 PEO–PPO–PEO triblock copolymer. Weak Lewis acids such as iron(III) chloride hexahydrate (Ka = 6.3 × 10-3), acetic acid (Ka = 1.8 × 10-5), copper(II) perchlorate hexahydrate (Ka = 1.6 × 10-7), cobalt(II) chloride hexahydrate (Ka = 1.3 × 10-9), nickel(II) chloride hexahydrate (Ka = 2.5 × 10-11) were used to obtain 2D and 3D mesostructures. Highly ordered p6mm and Im3m mesostructures were obtained using iron(III) chloride hexahydrate without any additional salts and strong acids. These results indicate clearly the π-π attraction force between bridged aromatic rings linked with silicon atom is working during sol-gel reaction and minimum acidity can be calculated from the result.
저자 조은범, 성필경
소속 서울과학기술대
키워드 Block Copolymer; Mesoporous Organosilica; Weak Acid
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