| 1 |
Preparation of CoMoS catalysts for hydrodesulfurization using methylacetoacetate as a chelating agent
Lee SI, Cho A, Koh JH, Moon SH
Korean Journal of Chemical Engineering, 29(3), 310, 2012 |
| 2 |
Performance of Ni-added Pd-Ag/Al2O3 catalysts in the selective hydrogenation of acetylene
Lee JH, Kim SK, Ahn IY, Kim WJ, Moon SH
Korean Journal of Chemical Engineering, 29(2), 169, 2012 |
| 3 |
Improved performance of Mo-V-Te-Nb-Ox catalysts prepared from a solution containing drying control chemical additives in propane oxidation to acrylic acid
Kum SS, Park YS, Moon SH
Korean Journal of Chemical Engineering, 28(6), 1364, 2011 |
| 4 |
Preparation of Pt/C electrocatalysts using an incipient precipitation method
Joh HI, Seo SJ, Kim HT, Moon SH
Korean Journal of Chemical Engineering, 27(1), 45, 2010 |
| 5 |
Effect of CeO2-addition sequence on the performance of CeO2-modified Ni/Al2O3 catalyst in autothermal reforming of iso-octane
Choi SO, Ahn IY, Moon SH
Korean Journal of Chemical Engineering, 26(5), 1252, 2009 |
| 6 |
Properties of unsupported MoS2 species produced in the preparation of MoS2/Al2O3 using a sonochemical method
Koh JH, Cho A, Lee SI, Moon SH
Korean Journal of Chemical Engineering, 26(4), 999, 2009 |
| 7 |
Comparison of atomic scale etching of poly-Si in inductively coupled Ar and He plasmas
Yun HJ, Kim TH, Shin CB, Kim CK, Min JH, Moon SH
Korean Journal of Chemical Engineering, 24(4), 670, 2007 |
| 8 |
고밀도 CHF3 플라즈마에서 바이어스 전압과 이온의 입사각이 Photoresist의 식각에 미치는 영향
강세구, 민재호, 이진관, 문상흡
Korean Chemical Engineering Research, 44(5), 498, 2006 |
| 9 |
Metalorganic chemical vapor deposition of SrxTiyOz thin films by using mixed metal precursors
Heo JS, Ryu HK, Cho YS, Kim JC, Moon SH
Korean Journal of Chemical Engineering, 23(1), 153, 2006 |
| 10 |
Thermodynamic Analysis of Liquid Source Chemical Vapor Deposition Process for the Preparation of a Ba-Sr-Ti Oxide Film
Cho YS, Cho SI, Heo JS, Moon SH
Korean Journal of Chemical Engineering, 21(1), 286, 2004 |
| 11 |
Thickness of a Modified Surface Layer Formed in a Silsesquioxane-based Low-k Material During Etching in a Fluorocarbon Plasma
Hwang SW, Lee GR, Min JH, Moon SH
Korean Journal of Chemical Engineering, 20(6), 1131, 2003 |
| 12 |
Trajectories of Ions inside a Faraday Cage Located in a High Density Plasma Etcher
Ryu JH, Cho BO, Hwang SW, Moon SH, Kim CK
Korean Journal of Chemical Engineering, 20(2), 407, 2003 |
| 13 |
Ethylene Selectivity Variation in Acetylene Hydrogenation Reactor with the Hydrogen/Acetylene Ratio at the Reactor Inlet
Kim WJ, Choi CH, Moon SH
Korean Journal of Chemical Engineering, 19(4), 617, 2002 |
| 14 |
Palladium-Hydrogen Interaction on Supported Palladium Catalysts of Different Metal Disperions
Shin EW, Cho SI, Kang JH, Kim WJ, Park JD, Moon SH
Korean Journal of Chemical Engineering, 17(4), 468, 2000 |
