검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
The kinetics of a negative-tone acrylic photoresist for 193-nm lithography Fu SC, Hsieh KH Journal of Polymer Science Part A: Polymer Chemistry, 38(6), 954, 2000 |
| 2 |
Plasma enhanced chemically vapor deposited thin films for microelectromechanical systems applications with tailored optical, thermal, and mechanical properties Horn MW, Goodman RB, Rothchild M Journal of Vacuum Science & Technology B, 17(3), 1045, 1999 |
| 3 |
Dry development in an O-2/SO2 plasma for sub-0.18 mu m top layer imaging processes Goethals AM, Van Roey F, Sugihara T, Van den Hove L, Vertommen J, Klippert W Journal of Vacuum Science & Technology B, 16(6), 3322, 1998 |
| 4 |
Reduction of line edge roughness in the top surface imaging process Mori S, Morisawa T, Matsuzawa N, Kaimoto Y, Endo M, Matsuo T, Kuhara K, Sasago M Journal of Vacuum Science & Technology B, 16(6), 3739, 1998 |
| 5 |
Pattern collapse in the top surface imaging process after dry development Mori S, Morisawa T, Matsuzawa N, Kaimoto Y, Endo M, Matsuo T, Kuhara K, Sasago M Journal of Vacuum Science & Technology B, 16(6), 3744, 1998 |
| 6 |
Wet Silylation and Oxygen Plasma Development of Photoresists - A Mature and Versatile Lithographic Process for Microelectronics and Microfabrication Gogolides E, Tzevelekis D, Grigoropoulos S, Tegou E, Hatzakis M Journal of Vacuum Science & Technology B, 14(5), 3332, 1996 |