화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride (vol 256, pg 7434, 2010)
Bosund M, Mattila P, Aierken A, Hakkarainen T, Koskenvaara H, Sopanen M, Airaksinen VM, Lipsanen H
Applied Surface Science, 257(6), 2412, 2011
2 Properties of AlN grown by plasma enhanced atomic layer deposition
Bosund M, Sajavaara T, Laitinen M, Huhtio T, Putkonen M, Airaksinen VM, Lipsanen H
Applied Surface Science, 257(17), 7827, 2011
3 GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
Bosund M, Mattila P, Aierken A, Hakkarainen T, Koskenvaara H, Sopanen M, Airaksinen VM, Lipsanen H
Applied Surface Science, 256(24), 7434, 2010
4 Investigation of sub-nm ALD aluminum oxide films by plasma assisted etch-through
Grigoras K, Franssila S, Airaksinen VM
Thin Solid Films, 516(16), 5551, 2008
5 Fabrication of Sub-100 nm GaAs Columns by Reactive Ion Etching Using Au Islands as Etching Mask
Ahopelto J, Airaksinen VM, Siren E, Niemi HE
Journal of Vacuum Science & Technology B, 13(1), 161, 1995