| 1 |
Reduction of local mechanical stress in a transistor using Si3N4/SiOxNy contact ESL
Toh SL, Loh KP, Boothroyd CB, Li K, Ang CH, Er E, Chan L
Electrochemical and Solid State Letters, 8(2), G38, 2005 |
| 2 |
Strain analysis in silicon substrates under uniaxial and biaxial stress by convergent beam electron diffraction
Toh SL, Loh KP, Boothroyd CB, Li K, Ang CH, Chan L
Journal of Vacuum Science & Technology B, 23(3), 940, 2005 |
| 3 |
Effect of NaOH on large-volume sample stacking of haloacetic acids in capillary zone electrophoresis with a low-pH buffer
Tu CH, Zhu LY, Ang CH, Lee HK
Electrophoresis, 24(12-13), 2188, 2003 |
| 4 |
Impacts of buffer oxide layer in nitride/oxide stack gate dielectrics on the device performance and dielectric reliability
Lin WH, Pey KL, Dong Z, Lim VSK, Chooi SYM, Zhou MS, Ang CH, Ang TC, Lau WS
Electrochemical and Solid State Letters, 5(4), F7, 2002 |
| 5 |
Suppression of nitridation-induced interface traps and hole mobility degradation by nitrogen plasma nitridation
Ang CH, Tan SS, Lek CM, Lin W, Zheng ZJ, Chen T, Cho BJ
Electrochemical and Solid State Letters, 5(4), G26, 2002 |
| 6 |
The impact of post-polysilicon gate process on ultra-thin gate oxide integrity
Ang CH, Ko LH, Lin WH, Zheng JZ
Solid-State Electronics, 46(2), 243, 2002 |
| 7 |
Annealing of Fowler-Nordheim stress-induced leakage currents in thin silicon dioxide films
Ang CH, Ling CH, Cheng ZY, Kim SJ, Cho BJ
Journal of the Electrochemical Society, 147(12), 4676, 2000 |
| 8 |
Radiation and electrical stress-induced hole trap-assisted tunneling currents in ultrathin gate oxides
Ang CH, Ling CH, Cho BJ, Kim SJ, Cheng ZY
Solid-State Electronics, 44(11), 2001, 2000 |
| 9 |
Kinetic-Study of Enantioselective Esterification of Ketoprofen with N-Propanol Catalyzed by an Lipase in an Organic Medium
Duan G, Ching CB, Lim E, Ang CH
Biotechnology Letters, 19(11), 1051, 1997 |
