화학공학소재연구정보센터
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No. Article
1 Interfacial layers in Ta2O5 based stacks and constituent depth profiles by spectroscopic ellipsometry
Karmakov Y, Paskaleva A, Atanassova E
Applied Surface Science, 258(10), 4507, 2012
2 Structural and dielectric properties of Ru-based gate/Hf-doped Ta2O5 stacks
Paskaleva A, Tapajna M, Dobrocka E, Husekova K, Atanassova E, Frohlich K
Applied Surface Science, 257(17), 7876, 2011
3 Charge trapping during constant current stress in Hf-doped Ta2O5 films sputtered on nitrided Si
Novkovski N, Atanassova E
Thin Solid Films, 519(7), 2262, 2011
4 Conducting and topographic AFM analysis of Hf-doped and Al-doped Ta2O5 films
Atanassova E, Lytvyn P, Konakova RV, Mitin VF, Spassov D
Thin Solid Films, 519(22), 8182, 2011
5 Spectroscopic ellipsometry of very thin tantalum pentoxide on Si
Karmakov I, Konova A, Atanassova E, Paskaleva A
Applied Surface Science, 255(22), 9211, 2009
6 Effect of Ti doping on Ta2O5 stacks with Ru and Al gates
Paskaleva A, Tapajna M, Atanassova E, Frohlich K, Vincze A, Dobrocka E
Applied Surface Science, 254(18), 5879, 2008
7 Electrical characteristics of Ti-doped Ta2O5 stacked capacitors
Atanassova E, Spassov D, Paskaleva A, Georgieva M, Kopninarova J
Thin Solid Films, 516(23), 8684, 2008
8 Stress-induced leakage currents of the RF sputtered Ta2O5 on N-implanted silicon
Novkovski N, Atanassova E, Paskaleva A
Applied Surface Science, 253(9), 4396, 2007
9 Wear-out of Al-Ta2O5/SiO2-Si structures under dynamic stress
Novkovski N, Atanassova E
Applied Surface Science, 252(10), 3833, 2006
10 Composition of Ta2O5 stacked films on N2O- and NH3-nitrided Si
Atanassova E, Spassov D, Paskaleva A, Kostov K
Applied Surface Science, 253(5), 2841, 2006