검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Multilayer Inorganic Antireflective System for Use in 248 nm Deep-Ultraviolet Lithography Cirelli RA, Weber GR, Kornblit A, Baker RM, Klemens FP, Demarco J, Pai CS Journal of Vacuum Science & Technology B, 14(6), 4229, 1996 |