1 |
Liquid clean formulations for stripping high-dose ion-implanted photoresist from microelectronic devices Visintin PM, Korzenski MB, Baum TH Journal of the Electrochemical Society, 153(7), G591, 2006 |
2 |
Synthesis and characterization of neutral cis-hexacoordinate bis(beta-diketonate) silicon(IV) complexes Xu CY, Baum TH, Rheingold AL Inorganic Chemistry, 43(4), 1568, 2004 |
3 |
Synthesis and characterization of (hfac)In(CH3)(2): A volatile compound useful for CVD of indium and indium-containing materials Xu CY, Baum TH, Guzei I, Rheingold AL Inorganic Chemistry, 39(9), 2008, 2000 |
4 |
Low-melting, mononuclear tetrahydrofuran complexes of M(2,2,6,6-tetremethylheptane-3,5-dionate)(2) (M = Ba, Sr) and related analogues Paw W, Baum TH, Lam KC, Rheingold AL Inorganic Chemistry, 39(9), 2011, 2000 |
5 |
Synthesis and Characterization of a bis(Mu-Beta-Diketonato)bis((1,2,5,6-Eta)-1,5-Dimethyl-1,5-Cyclaoctadiene)Disilver Complex - An Intermediate in the Synthesis of an Isomerically Pure (Beta-Diketonato)((1,2,5,6-Eta)-1,5-Dimethyl-1,5-Cyclooctadiene)Copper(I) Complex Doppelt P, Baum TH, Ricard L Inorganic Chemistry, 35(5), 1286, 1996 |
6 |
The Chemical-Vapor-Deposition of Copper and Copper-Alloys Doppelt P, Baum TH Thin Solid Films, 270(1-2), 480, 1995 |