화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Real-Time, Noninvasive Temperature Control of Wafer Processing Based on Diffusive Reflectance Spectroscopy
Wang ZZ, Kwan SL, Pearsall TP, Booth JL, Beard BT, Johnson SR
Journal of Vacuum Science & Technology B, 15(1), 116, 1997
2 In-Situ Wafer Temperature Monitoring of Silicon Etching Using Diffuse-Reflectance Spectroscopy
Booth JL, Beard BT, Stevens JE, Blain MG, Meisenheimer TL
Journal of Vacuum Science & Technology A, 14(4), 2356, 1996