화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Effect of Pad Surface Micro-Texture on Coefficient of Friction and Removal Rate during Copper CMP Process
Liao X, Zhuang Y, Borucki LJ, Theng S, Wei X, Ashizawa T, Philipossian A
Electrochemical and Solid State Letters, 14(5), H201, 2011
2 Fluid pressures and pad topography in chemical mechanical polishing
Borucki LJ, Ng SH, Danyluk S
Journal of the Electrochemical Society, 152(5), G391, 2005
3 Topography simulation for the virtual wafer fab
Cale TS, Merchant TP, Borucki LJ, Labun AH
Thin Solid Films, 365(2), 152, 2000
4 Multiple scale integrated modeling of deposition processes
Merchant TP, Gobbert MK, Cale TS, Borucki LJ
Thin Solid Films, 365(2), 368, 2000
5 A Multiscale Simulator for Low-Pressure Chemical-Vapor-Deposition
Gobbert MK, Merchant TP, Borucki LJ, Cale TS
Journal of the Electrochemical Society, 144(11), 3945, 1997