검색결과 : 8건
| No. | Article |
|---|---|
| 1 |
Formation of Submicrometer Pore Arrays by Electrochemical Etching of Silicon and Nanoimprint Lithography Laffite G, Roumanie M, Gourgon C, Perret C, Boussey J, Kleimann P Journal of the Electrochemical Society, 158(1), D10, 2011 |
| 2 |
Impact of the resist properties on the antisticking layer degradation in UV nanoimprint lithography Francone A, Iojoiu C, Poulain C, Lombard C, Pepin-Donat B, Boussey J, Zelsmann M Journal of Vacuum Science & Technology B, 28(6), C6M72, 2010 |
| 3 |
Double-anchoring fluorinated molecules for antiadhesion mold treatment in UV nanoimprint lithography Zelsmann M, Truffier-Boutry D, Francone A, Alleaume C, Kurt I, Beaurain A, Pelissier B, Pepin-Donat B, Lombard C, Boussey J Journal of Vacuum Science & Technology B, 27(6), 2873, 2009 |
| 4 |
Epoxy silsesquioxane resists for UV nanoimprint lithography De Girolamo J, Chouiki M, Tortai JH, Sourd C, Derrough S, Zelsmann M, Boussey J Journal of Vacuum Science & Technology B, 26(6), 2271, 2008 |
| 5 |
Photopolymerization kinetic study of UV nanoimprint lithography dedicated resists Voisin P, Zelsmann M, Ridaoui H, Chouiki M, Gourgon C, Boussey J, Zahouily K Journal of Vacuum Science & Technology B, 25(6), 2384, 2007 |
| 6 |
Improved release strategy for UV nanoimprint lithography Garidel S, Zelsmann M, Chaix N, Voisin P, Boussey J, Beaurain A, Pelissier B Journal of Vacuum Science & Technology B, 25(6), 2430, 2007 |
| 7 |
A miniature silicon hot wire sensor for automatic wind speed measurements Laghrouche A, Adane A, Boussey J, Ameur S, Meunier D, Tardu S Renewable Energy, 30(12), 1881, 2005 |
| 8 |
Characterization of silicon-on-sapphire material and devices for radio frequency applications Munteanu D, Cristoloveanu S, Rozeau O, Jomaah J, Boussey J, Wetzel M, de la Houssaye P, Lagnado I Journal of the Electrochemical Society, 148(4), G218, 2001 |