검색결과 : 4건
No. | Article |
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1 |
Oxygen addition to fluorine based SiN etch process: Impact on the electrical properties of AlGaN/GaN 2DEG and transistor characteristics Hahn H, Achenbach J, Ketteniss N, Noculak A, Kalisch H, Vescan A Solid-State Electronics, 67(1), 90, 2012 |
2 |
Plasma-Treated Superhydrophobic Polyethylene Surfaces: Fabrication, Wetting and Dewetting Properties Fresnais J, Chapel JP, Benyahia L, Poncin-Epaillard F Journal of Adhesion Science and Technology, 23(3), 447, 2009 |
3 |
Decomposition of tetrafluoromethane by water plasma generated under atmospheric pressure Narengerile, Saito H, Watanabe T Thin Solid Films, 518(3), 929, 2009 |
4 |
A Model-Based Technique for Real-Time Estimation of Absolute Fluorine Concentration in a CF4/Ar Plasma Hanish PD, Grizzle JW, Giles MD, Terry FL Journal of Vacuum Science & Technology A, 13(3), 1802, 1995 |