화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Oxygen addition to fluorine based SiN etch process: Impact on the electrical properties of AlGaN/GaN 2DEG and transistor characteristics
Hahn H, Achenbach J, Ketteniss N, Noculak A, Kalisch H, Vescan A
Solid-State Electronics, 67(1), 90, 2012
2 Plasma-Treated Superhydrophobic Polyethylene Surfaces: Fabrication, Wetting and Dewetting Properties
Fresnais J, Chapel JP, Benyahia L, Poncin-Epaillard F
Journal of Adhesion Science and Technology, 23(3), 447, 2009
3 Decomposition of tetrafluoromethane by water plasma generated under atmospheric pressure
Narengerile, Saito H, Watanabe T
Thin Solid Films, 518(3), 929, 2009
4 A Model-Based Technique for Real-Time Estimation of Absolute Fluorine Concentration in a CF4/Ar Plasma
Hanish PD, Grizzle JW, Giles MD, Terry FL
Journal of Vacuum Science & Technology A, 13(3), 1802, 1995