검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Atomic layer epitaxy of copper - Growth and selectivity in the Cu(II)-2,2,6,6-tetramethyl-3,5-heptanedionate/H-2 process Martensson P, Carlsson JO Journal of the Electrochemical Society, 145(8), 2926, 1998 |
| 2 |
Deposition mechanism of MOCVD copper films in the presence of water vapor Kim JY, Lee YK, Park HS, Park JW, Park DK, Joo JH, Lee WH, Ko YK, Reucroft PJ, Cho BR Thin Solid Films, 330(2), 190, 1998 |
| 3 |
Cu CVD from Copper(II) Hexafluoroacetylacetonate .1. A Cold-Wall Reactor Design, Blanket Growth-Rate, and Natural Selectivity Chen YD, Reisman A, Turlik I, Temple D Journal of the Electrochemical Society, 142(11), 3903, 1995 |