검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Nucleation reactions and film growth of copper on TiN using hexafluoroacetylacetonate copper(I) trimethylvinylsilane Kim DH, Lee YJ, Park CO, Park JW, Kim JJ Chemical Engineering Communications, 153, 307, 1996 |
| 2 |
Growth and Resistivity Behavior of Copper Film by Chemical-Vapor-Deposition Choi ES, Park SK, Lee HH Journal of the Electrochemical Society, 143(2), 624, 1996 |
| 3 |
Characterization of Thin Copper-Films Grown via Chemical-Vapor-Deposition Using Liquid Coinjection of Trimethylvinylsilane and (Hexafluoroacetylacetonate) Cu (Trimethylvinylsilane) Parmeter JE, Petersen GA, Smith PM, Apblett CA, Reid JS, Norman JA, Hochberg AK, Roberts DA, Omstead TR Journal of Vacuum Science & Technology B, 13(1), 130, 1995 |
| 4 |
Cu-Metal Interfacial Interactions During Metal-Organic Chemical-Vapor-Deposition Nuesca GM, Kelber JA Thin Solid Films, 262(1-2), 224, 1995 |