| 1 |
Corrosion behaviour and microstructure of tantalum film on Ti6Al4V substrate by filtered cathodic vacuum arc deposition
Hee AC, Zhao Y, Jamali SS, Martin PJ, Bendavid A, Peng H, Cheng XW
Thin Solid Films, 636, 54, 2017 |
| 2 |
Effects of filtered cathodic vacuum arc deposition (FCVAD) conditions on photovoltaic TiO2 films
Aramwit C, Intarasiri S, Bootkul D, Tippawan U, Supsermpol B, Seanphinit N, Ruangkul W, Yu LD
Applied Surface Science, 310, 266, 2014 |
| 3 |
Effects of incidence angle on the structure and properties of cathodic vacuum arc deposition MgO thin films
Zhu DY, Liu Y, Zheng CX, Wang MD, Chen DH, He ZH
Materials Chemistry and Physics, 134(2-3), 1167, 2012 |
| 4 |
Influence of the substrate position angle on the adhesion of ZnO thin films deposited on polyimide foil substrates
Hu CJ, Zhu DY, He ZH, Fu WC, Zhong Q
Applied Surface Science, 257(7), 2801, 2011 |
| 5 |
Apatite formation from simulated body fluid on various phases of TiO2 thin films prepared by filtered cathodic vacuum arc deposition
Amin MS, Randeniya LK, Bendavid A, Martin PJ, Preston EW
Thin Solid Films, 519(4), 1300, 2010 |
| 6 |
Tribological characterization of chromium nitride coating deposited by filtered cathodic vacuum arc
Mo JL, Zhu MH
Applied Surface Science, 255(17), 7627, 2009 |
| 7 |
The effect of pulsed direct current substrate bias on the properties of titanium dioxide thin films deposited by filtered cathodic vacuum arc deposition
Bendavid A, Martin PJ, Preston EW
Thin Solid Films, 517(2), 494, 2008 |
| 8 |
Characterization of as grown and nitrogen incorporated tetrahedral amorphous carbon films deposited by pulsed unfiltered cathodic vacuum arc process
Panwar OS, Deb B, Satyanarayana BS, Khan MA, Bhattacharyya R, Pal AK
Thin Solid Films, 472(1-2), 180, 2005 |
| 9 |
Etching behaviour of pure and metal containing amorphous carbon films prepared using filtered cathodic vacuum arc technique
Yu LJ, Sheeja D, Tay BK, Chua DHC, Milne WI, Miao J, Fu YQ
Applied Surface Science, 195(1-4), 107, 2002 |
