화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Epoxy silsesquioxane resists for UV nanoimprint lithography
De Girolamo J, Chouiki M, Tortai JH, Sourd C, Derrough S, Zelsmann M, Boussey J
Journal of Vacuum Science & Technology B, 26(6), 2271, 2008
2 Photopolymerization kinetic study of UV nanoimprint lithography dedicated resists
Voisin P, Zelsmann M, Ridaoui H, Chouiki M, Gourgon C, Boussey J, Zahouily K
Journal of Vacuum Science & Technology B, 25(6), 2384, 2007
3 Electrochemistry of nitrogen-incorporated hydrogenated amorphous carbon films
Cachet H, Deslouis C, Chouiki M, Saidani B, Conway NMJ, Godet C
Journal of the Electrochemical Society, 149(7), E233, 2002