화학공학소재연구정보센터
검색결과 : 9건
No. Article
1 High dose rate effects in silicon by plasma source ion implantation
Chun M, Kim B, Conrad JR, Matyi RJ, Malik SM, Fetherston P, Han S
Journal of Vacuum Science & Technology B, 17(2), 863, 1999
2 Pilot-Scale Bioremediation of PAH-Contaminated Soils
Pradhan SP, Paterek JR, Liu BY, Conrad JR, Srivastava VJ
Applied Biochemistry and Biotechnology, 63-65, 759, 1997
3 Development of an Energetic Ion-Assisted Mixing and Deposition Process for TiNx and Diamond-Like Carbon-Films, Using a Coaxial Geometry in Plasma Source Ion-Implantation
Malik SM, Fetherston RP, Conrad JR
Journal of Vacuum Science & Technology A, 15(6), 2875, 1997
4 A Fretting Wear Study of a Nitrogen-Implanted Titanium-Alloy
Horswill NC, Sridharan K, Conrad JR
Journal of Materials Science Letters, 14(19), 1349, 1995
5 Papers from the 1st International Workshop on Plasma-Based Ion-Implantation - 4-6 August 1993 University-of-Wisconsin-Madison Madison, Wisconsin - Preface
Conrad JR, Sridharan K
Journal of Vacuum Science & Technology B, 12(2), 813, 1994
6 Overview of Plasma Source Ion-Implantation Research at University-of-Wisconsin-Madison
Malik SM, Sridharan K, Fetherston RP, Chen A, Conrad JR
Journal of Vacuum Science & Technology B, 12(2), 843, 1994
7 Dose Analysis of Nitrogen Plasma Source Ion-Implantation Treatment of Titanium-Alloys
Chen A, Firmiss J, Conrad JR
Journal of Vacuum Science & Technology B, 12(2), 918, 1994
8 Structural Characterization of Plasma-Doped Silicon by High-Resolution X-Ray-Diffraction
Chapek DL, Conrad JR, Matyi RJ, Felch SB
Journal of Vacuum Science & Technology B, 12(2), 951, 1994
9 Sputter-Deposition of Tantalum-Nitride Films on Copper Using an RF-Plasma
Walter KC, Fetherston RP, Sridharan K, Chen A, Shamim MM, Conrad JR
Materials Research Bulletin, 29(8), 827, 1994