검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
Generation of isofocal target patterns using process modeling during optical proximity correction Melvin LS, Croffie E, Biswas A Journal of Vacuum Science & Technology B, 24(6), 2815, 2006 |
| 2 |
Improving resist resolution and sensitivity via electric-field enhanced postexposure baking Cheng MS, Yuan L, Croffie E, Neureuther A Journal of Vacuum Science & Technology B, 20(2), 734, 2002 |
| 3 |
Modeling anomalous depth dependent dissolution effects in chemically amplified resists Cheng MS, Tyminski J, Croffie E, Neureuther A Journal of Vacuum Science & Technology B, 18(3), 1294, 2000 |
| 4 |
Enhancement of resist resolution and sensitivity via applied electric field Cheng MS, Croffie E, Yuan L, Neureuther A Journal of Vacuum Science & Technology B, 18(6), 3318, 2000 |
| 5 |
Modeling influence of structural changes in photoacid generators an 193 nm single layer resist imaging Croffie E, Yuan L, Cheng MS, Neureuther A, Houlihan F, Cirelli R, Watson P, Nalamasu O, Gabor A Journal of Vacuum Science & Technology B, 18(6), 3340, 2000 |
| 6 |
Moving boundary transport model for acid diffusion in chemically amplified resists Croffie E, Cheng MS, Neureuther A Journal of Vacuum Science & Technology B, 17(6), 3339, 1999 |