검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Time-Resolved Fourier Transform Emission Spectroscopy of CF3Br and CF3CFHCF3 in a Pulsed Electrical Discharge Ferus M, Civis S, Kubelik P, Nevrly V, Bitala P, Grigorova E, Strizik M, Kubat P, Zelinger Z Plasma Chemistry and Plasma Processing, 31(3), 417, 2011 |
| 2 |
Influence on Selective SiO2/Si Etching of Carbon-Atoms Produced by CH4 Addition to a C4F8 Permanent-Magnet Electron-Cyclotron-Resonance Etching Plasma Den S, Kuno T, Ito M, Hori M, Goto T, Okeeffe P, Hayashi Y, Sakamoto Y Journal of Vacuum Science & Technology A, 15(6), 2880, 1997 |
| 3 |
Analysis of Pulse-Time Modulated High-Density Discharges Meyyappan M Journal of Vacuum Science & Technology A, 14(4), 2122, 1996 |
| 4 |
Infrared Diode-Laser Absorption-Spectroscopy Measurements of Cfx (X=1-3) Radical Densities in Electron-Cyclotron Employing C4F8, C2F6, CF4, and Chf3 Gases Miyata K, Hori M, Goto T Journal of Vacuum Science & Technology A, 14(4), 2343, 1996 |