검색결과 : 7건
| No. | Article |
|---|---|
| 1 |
Hyperbranched Polymers for Photolithographic Applications - Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances Chochos CL, Ismailova E, Brochon C, Leclerc N, Tiron R, Sourd C, Bandelier P, Foucher J, Ridaoui H, Dirani A, Soppera O, Perret D, Brault C, Serra CA, Hadziioannou G Advanced Materials, 21(10-11), 1121, 2009 |
| 2 |
Linewidth roughness transfer measured by critical dimension atomic force microscopy during plasma patterning of polysilicon gate transistors Pargon E, Martin M, Thiault J, Joubert O, Foucher J, Lill T Journal of Vacuum Science & Technology B, 26(3), 1011, 2008 |
| 3 |
Tip characterization and surface reconstruction of complex structures with critical dimension atomic force microscopy Dahlen G, Osborn M, Okulan N, Foreman W, Chand A, Foucher J Journal of Vacuum Science & Technology B, 23(6), 2297, 2005 |
| 4 |
Full three-dimensional characterization of 25 nm lines for chemically amplified resist simulation Landis S, Pauliac S, Foucher J, Thiault J, de Crecy F Journal of Vacuum Science & Technology B, 23(6), 2733, 2005 |
| 5 |
Line edge roughness characterization with a three-dimensional atomic force microscope: Transfer during gate patterning processes Thiault J, Foucher J, Tortai JH, Joubert O, Landis S, Pauliac S Journal of Vacuum Science & Technology B, 23(6), 3075, 2005 |
| 6 |
Chemical topography analyses of silicon gates etched in HBr/Cl-2/O-2 and HBr/Cl-2/O-2/CF4 high density plasmas Vallier L, Foucher J, Detter X, Pargon E, Joubert O, Cunge G, Lill T Journal of Vacuum Science & Technology B, 21(2), 904, 2003 |
| 7 |
Design of notched gate processes in high density plasmas Foucher J, Cunge G, Vallier L, Joubert O Journal of Vacuum Science & Technology B, 20(5), 2024, 2002 |