검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Integrated Plasma Equipment Model for Polysilicon Etch Profiles in an Inductively-Coupled Plasma Reactor with Subwafer and Superwafer Topography Hoekstra RJ, Grapperhaus MJ, Kushner MJ Journal of Vacuum Science & Technology A, 15(4), 1913, 1997 |