화학공학소재연구정보센터
검색결과 : 8건
No. Article
1 Batch CVD process for depositing Pd activation layers
Wang LD, Griffin GL
Journal of the Electrochemical Society, 154(3), D151, 2007
2 Kinetics of copper CVD using solution delivery of Cu(hfac)(2) and isopropanol
Wang LD, Griffin GL
Journal of the Electrochemical Society, 153(3), C137, 2006
3 Solution delivery of Cu(hfac)(2) for alcohol-assisted chemical vapor deposition of copper
Borgharkar NS, Griffin GL, Fan H, Maverick AW
Journal of the Electrochemical Society, 146(3), 1041, 1999
4 Toward a unified reaction mechanism for chemical vapor deposition of copper
Borgharkar NS, Griffin GL
Journal of the Electrochemical Society, 145(1), 347, 1998
5 Alcohol-assisted growth of copper CVD films
Borgharkar NS, Griffin GL, James A, Maverick AW
Thin Solid Films, 320(1), 86, 1998
6 Wet Chemical Etching with Lactic-Acid Solutions for InP-Based Semiconductor-Devices
Ikossianastasiou K, Binari SC, Kelner G, Boos JB, Kyono CS, Mittereder J, Griffin GL
Journal of the Electrochemical Society, 142(10), 3558, 1995
7 Reactor Transport Effects in Copper APCVD
Wang J, Little RB, Lai WG, Griffin GL
Thin Solid Films, 262(1-2), 31, 1995
8 Gas-Phase Kinetics for TiO2 CVD - Hot-Wall Reactor Results
Zhang QM, Griffin GL
Thin Solid Films, 263(1), 65, 1995