검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Defect reduction in GaN regrown on hexagonal mask structure by facet assisted lateral overgrowth Jazi MA, Meisch T, Klein M, Scholz F Journal of Crystal Growth, 429, 13, 2015 |
| 2 |
Control of topography and morphology for channel SiGe by in-situ HCl etching for future CMOS technologies with high-K metal gate Reichel C, Kronholz S, Kammler T, Zeun A, Beernink G Solid-State Electronics, 60(1), 134, 2011 |
| 3 |
In situ HCl etching of Si for the elaboration of locally misorientated surfaces Destefanis V, Morand Y, Hartmann JM, Rouchon D, Barbe JC, Mermoux M Applied Surface Science, 254(5), 1436, 2007 |
| 4 |
Chemical vapor phase etching of polycrystalline selective to epitaxial Si and SiGe Yamamoto Y, Tillack B, Kopke K, Fursenko O Thin Solid Films, 508(1-2), 297, 2006 |