검색결과 : 12건
| No. | Article |
|---|---|
| 1 |
Hardness and adhesion properties of HfN/Si3N4 and NbN/Si3N multilayer coatings Jeong JJ, Hwang SK, Lee CM Materials Chemistry and Physics, 77(1), 27, 2003 |
| 2 |
HfN/Si 3 3 N 4 4 와 NbN/ Si3N4Si 3 N 4 다층박막의 기계적 특성 정진중, 황선근, 이종무 Korean Journal of Materials Research, 11(3), 236, 2001 |
| 3 |
Optical and electronic properties of sputtered TiNx thin films Schmid PE, Sunaga MS, Levy F Journal of Vacuum Science & Technology A, 16(5), 2870, 1998 |
| 4 |
Structure and mechanical properties of vacuum arc-deposited NbN coatings Zhitomirsky VN, Grimberg I, Rapoport L, Travitzky NA, Boxman RL, Goldsmith S, Raihel A, Lapsker I, Weiss BZ Thin Solid Films, 326(1-2), 134, 1998 |
| 5 |
Formation of titanium nitride films by energetic cluster impact deposition Yu GQ, Chen JS, Shi Y, Pan HC, Zhu DZ, Xu HJ, Zheng ZH Thin Solid Films, 335(1-2), 59, 1998 |
| 6 |
Thermal fatigue of hot work tool steel with hard coatings Starling CMD, Branco JRT Thin Solid Films, 308-309, 436, 1997 |
| 7 |
Residual Macroscopic Stress in Highly Preferentially Oriented Titanium Nitride Coatings Deposited on Various Steel Types Quaeyhaegens C, Knuyt G, Stals LM Journal of Vacuum Science & Technology A, 14(4), 2462, 1996 |
| 8 |
Plasma-Induced Deposition of Titanium Nitride from TiCl4 in a Direct-Current Glow-Discharge - Control of the Chlorine Content and Gas-Phase Nucleation Patscheider J, Li SZ, Veprek S Plasma Chemistry and Plasma Processing, 16(3), 341, 1996 |
| 9 |
Tin Films Prepared by Unbalanced Planar Magnetron Sputtering Under Control of Photoemission of Ti Tominaga K, Inoue S, Howson RP, Kusaka K, Hanabusa T Thin Solid Films, 281-282, 182, 1996 |
| 10 |
Residual-Stress in Metal-Ion Implanted Titanium Nitride Films Studied by Glancing Incidence X-Ray-Diffraction Perry AJ, Treglio JR, Valvoda V, Rafaja D Journal of Vacuum Science & Technology A, 13(3), 1067, 1995 |