검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
High-quality CVD SiO2 interfacial layer prepared by cyclic deposition with O-2 plasma treatment Hamamura H, Matsumura M, Mine T, Torii K Journal of the Electrochemical Society, 153(7), G636, 2006 |
| 2 |
Surface reaction probabilities of radicals correlated from film thickness contours in silane chemical vapor deposition Tsai DS, Chang TC, Hsin WC, Hamamura H, Shimogaki Y Thin Solid Films, 411(2), 177, 2002 |
| 3 |
Structural change of TiN/Ti/SiO2 multilayers by N-2 annealing Hamamura H, Itoh H, Shimogaki Y, Aoyama J, Yoshimi T, Ueda J, Komiyama H Thin Solid Films, 320(1), 31, 1998 |