검색결과 : 10건
| No. | Article |
|---|---|
| 1 |
Exploring growth conditions and Eu2+ concentration effects for KSr2I5:Eu scintillator crystals Stand L, Zhuravleva M, Camarda G, Lindsey A, Johnson J, Hobbs C, Melcher CL Journal of Crystal Growth, 439, 93, 2016 |
| 2 |
Characterization of heavily doped SOI wafers under pseudo-MOSFET configuration Liu FY, Diab A, Ionica I, Akarvardar K, Hobbs C, Ouisse T, Mescot X, Cristoloveanu S Solid-State Electronics, 90, 65, 2013 |
| 3 |
(110) and (100) Sidewall-oriented FinFETs: A performance and reliability investigation Young CD, Akarvardar K, Baykan MO, Matthews K, Ok I, Ngai T, Ang KW, Pater J, Smith CE, Hussain MM, Majhi P, Hobbs C Solid-State Electronics, 78, 2, 2012 |
| 4 |
Thermal effects on H-1 and H-2 distributions determined by SIMS in atomic layer deposition of HfO2 and A1(2)O(3) using heavy water Holliger P, Hobbs C, Jalabert D, Martin F, Pierre F, Reimbold G, Rivallin P Applied Surface Science, 252(19), 7194, 2006 |
| 5 |
Variations in backwash efficiency during colloidal filtration of hollow-fiber microfiltration membranes Hong SK, Krishna P, Hobbs C, Kim DH, Cho JW Desalination, 173(3), 257, 2005 |
| 6 |
Impact of deposition and annealing temperature on material and electrical characteristics of ALD HfO2 Triyoso D, Liu R, Roan D, Ramon M, Edwards NV, Gregory R, Werho D, Kulik J, Tam G, Irwin E, Wang XD, La LB, Hobbs C, Garcia R, Baker J, White BE, Tobin P Journal of the Electrochemical Society, 151(10), F220, 2004 |
| 7 |
Investigation of titanium nitride gates for tantalum pentoxide and titanium dioxide dielectrics Gilmer D, Hobbs C, Hegde R, La L, Adetutu O, Conner J, Tiner M, Prabhu L, Bagchi S, Tobin P Journal of Vacuum Science & Technology A, 18(4), 1158, 2000 |
| 8 |
Comparison of plasma chemistries for dry etching of Ta2O5 Lee KP, Jung KB, Singh RK, Pearton SJ, Hobbs C, Tobin P Journal of Vacuum Science & Technology A, 18(4), 1169, 2000 |
| 9 |
Ultraviolet light enhancement of Ta2O5 dry etch rates Lee KP, Cho H, Singh RK, Pearton SJ, Hobbs C, Tobin P Journal of Vacuum Science & Technology B, 18(1), 293, 2000 |
| 10 |
Inductively coupled plasma etching of Ta2O5 Lee KP, Jung KB, Singh RK, Pearton SJ, Hobbs C, Tobin P Journal of the Electrochemical Society, 146(10), 3794, 1999 |