검색결과 : 8건
| No. | Article |
|---|---|
| 1 |
Upgrading copper slag cleaning tailings for re-use Holland K, Eric RH, Taskinen P, Jokilaakso A Minerals Engineering, 133, 35, 2019 |
| 2 |
Characterization of thermoset and thermoplastic polyurethane pads, and molded and non-optimized machined grooving methods for oxide chemical mechanical planarization applications Sampurno Y, Borucki L, Zhuang Y, Misra S, Holland K, Boning D, Philipossian A Thin Solid Films, 517(5), 1719, 2009 |
| 3 |
Selectivity switch concept in Cu chemical mechanical planarization and its implementation on orbital tools Gotkis Y, Alamgir S, Yang L, Dai F, Mitchell F, Nguyen J, Shumway L, Walesa LR, Yang J, Nunan P, Holland K Journal of Vacuum Science & Technology B, 17(5), 2262, 1999 |
| 4 |
Optical endpoint detection for chemical mechanical planarization Bibby T, Adams JA, Holland K Journal of Vacuum Science & Technology B, 17(5), 2378, 1999 |
| 5 |
CWA helps treat chem wastewater Holland K, Mullan JD Chemical Processing, 61(10), 67, 1998 |
| 6 |
Von-Mises Stress in Chemical-Mechanical Polishing Processes Wang D, Lee J, Holland K, Bibby T, Beaudoin S, Cale T Journal of the Electrochemical Society, 144(3), 1121, 1997 |
| 7 |
Stress distribution in chemical mechanical polishing Srinivasa-Murthy C, Wang D, Beaudoin SP, Bibby T, Holland K, Cale TS Thin Solid Films, 308-309, 533, 1997 |
| 8 |
CMP CoO reduction : slurry reprocessing Bibby TFA, Adams JA, Holland K, Krulik GA, Parikh P Thin Solid Films, 308-309, 538, 1997 |