| 1 |
Role of chamber pressure on crystallinity and composition of silicon films using silane and methane as precursors in hot-wire chemical vapour deposition technique
Madaka R, Kumari J, Kanneboina V, Jha HS, Agarwal P
Thin Solid Films, 682, 126, 2019 |
| 2 |
Poole-Frenkel emission and defect density in a-Si:H/nc-Si:H multilayer films for "all silicon" third generation photovoltaics
Kherodia A, Panchal AK
Thin Solid Films, 654, 16, 2018 |
| 3 |
Problem of catalyst ageing during the hot-wire chemical vapour deposition of thin silicon films
Hrunski D, Scheib M, Mertz M, Schroeder B
Thin Solid Films, 517(11), 3370, 2009 |
| 4 |
Hot wire CVD deposition of nanocrystalline silicon solar cells on rough substrates
Li HBBT, van der Werf KHM, Rath JK, Schropp REI
Thin Solid Films, 517(12), 3476, 2009 |
| 5 |
Improved deposition rates for mu c-Si : H at low substrate temperature
Klein S, Finger F, Carius R, Lossen J
Thin Solid Films, 501(1-2), 43, 2006 |
| 6 |
Low substrate temperature deposition of crystalline SiC using HWCVD
Klein S, Carius R, Finger F, Houben L
Thin Solid Films, 501(1-2), 169, 2006 |
| 7 |
Microcrystalline silicon films and solar cells deposited by PECVD and HWCVD
Klein S, Repmann T, Brammer T
Solar Energy, 77(6), 893, 2004 |
| 8 |
The influence of the filament temperature on the structure of hot-wire deposited silicon
van der Werf CHM, van Veenendaal PATT, van Veen MK, Hardeman AJ, Rusche MYS, Rath JK, Schropp REI
Thin Solid Films, 430(1-2), 46, 2003 |
| 9 |
Deposition of HWCVD poly-Si films at a high growth rate
Rath JK, Hardeman AJ, van der Werf CHM, van Veenendaal PATT, Rusche MYS, Schropp REI
Thin Solid Films, 430(1-2), 67, 2003 |
| 10 |
Revisiting the B-factor variation in a-SiC : H deposited by HWCVD
Swain BP, Patil SB, Kumbhar A, Dusane RO
Thin Solid Films, 430(1-2), 186, 2003 |
