화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Improved Within-Wafer Uniformity Modeling Through the Use of Maximum-Likelihood-Estimation of the Mean and Covariance Surfaces
Davis JC, Hughesoliver JM, Lu JC, Gyurcsik RS
Journal of the Electrochemical Society, 143(10), 3404, 1996
2 Improved Within-Wafer Uniformity Modeling Through the Use of Maximum-Likelihood-Estimation of the Mean and Covariance Surfaces (Vol 143, Pg 3404, 1996)
Davis JC, Hughesoliver JM, Lu JC, Gyurcsik RS
Journal of the Electrochemical Society, 143(12), 4129, 1996