| 1 |
Effects of thermal annealing on performance of silicon nitride anode for lithium-ion battery applications
Zhang F, Cao YZ, Huang QA, Huang XD
Journal of Electroanalytical Chemistry, 845, 119, 2019 |
| 2 |
Passivation property of ultrathin SiOx:H / a-Si:H stack layers for solar cell applications
Lozac'h M, Nunomura S, Sai H, Matsubara K
Solar Energy Materials and Solar Cells, 185, 8, 2018 |
| 3 |
Poole-Frenkel emission and defect density in a-Si:H/nc-Si:H multilayer films for "all silicon" third generation photovoltaics
Kherodia A, Panchal AK
Thin Solid Films, 654, 16, 2018 |
| 4 |
Surface chemistry of a hydrogenated mesoporous p-type silicon
Media EM, Outemzabet R
Applied Surface Science, 395, 61, 2017 |
| 5 |
Thin-film amorphous silicon germanium solar cells with p- and n-type hydrogenated silicon oxide layers
Si FT, Isabella O, Zeman M
Solar Energy Materials and Solar Cells, 163, 9, 2017 |
| 6 |
Thin SiO2/a-Si:H/SiO2 multilayer insulators obtained by electron cyclotron resonance chemical vapor deposition at room temperature for possible application in non-volatile memories
Mateos D, Diniz JA, Nedev N, Munoz SNM, Curiel M, Mederos M, Valdez B, Montero G
Thin Solid Films, 628, 96, 2017 |
| 7 |
Thermal post-deposition treatment effects on nanocrystalline hydrogenated silicon prepared by PECVD under different hydrogen flow rates
Ben Amor S, Meddeb H, Daik R, Ben Othman A, Ben Slama S, Dimassi W, Ezzaouia H
Applied Surface Science, 360, 572, 2016 |
| 8 |
Investigation of functionalized silicon nanowires by self-assembled monolayer
Hemed NM, Convertino A, Shacham-Diamand Y
Applied Surface Science, 367, 231, 2016 |
| 9 |
Effect of substrate temperature on microstructure and optical properties of hydrogenated nanocrystalline Si thin films grown by plasma enhanced chemical vapor deposition
Ben Amor S, Atyaoui M, Bousbih R, Haddadi I, Dimassi W, Ezzaouia H
Solar Energy, 108, 126, 2014 |
| 10 |
Structural properties of hydrogenated microcrystalline silicon-carbon alloys deposited by Radio Frequency Plasma Enhanced Chemical Vapor Deposition: Effect of microcrystalline silicon seed layer and methane flow rate
Gaiaschi S, Ruggeri R, Johnson EV, Bulkin P, Chapon P, Gueunier-Farret ME, Mannino G, Longeaud C, Kleider JP
Thin Solid Films, 550, 312, 2014 |
