화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 The Hydrogen Reduction of Wf6 - A Kinetic-Study Based on in-Situ Partial-Pressure Measurements
Oosterlaken TG, Leusink GJ, Janssen GC, Radelaar S
Journal of the Electrochemical Society, 143(5), 1668, 1996
2 The Effect of Doping Atoms on the Kinetics of Self-Limiting Tungsten Film Growth on Silicon by Reduction of Tungsten Hexafluoride
Vanderjeugd CA, Leusink GJ, Oosterlaken TG, Jongste JF, Janssen GC, Radelaar S
Journal of the Electrochemical Society, 142(4), 1326, 1995