화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Development of a low pressure microwave excited plasma and its application to the formation of microcrystalline silicon films
Kikukawa D, Hori M, Honma K, Yamamoto M, Goto T, Takahashi S, Den S
Journal of Vacuum Science & Technology A, 24(6), 2128, 2006
2 Effects of initial layers on surface roughness and crystallinity of microcrystalline silicon thin films formed by remote electron cyclotron resonance silane plasma
Murata K, Kikukawa D, Hori M, Goto T, Ito M
Journal of Vacuum Science & Technology A, 20(3), 953, 2002