검색결과 : 1건
No. | Article |
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1 |
Expression for the growth rate of selective epitaxial growth of silicon using dichlorosilane, hydrogen chloride, and hydrogen in a low pressure chemical vapor deposition pancake reactor Kongetira P, Neudeck GW, Takoudis CG Journal of Vacuum Science & Technology B, 15(6), 1902, 1997 |