화학공학소재연구정보센터
검색결과 : 7건
No. Article
1 Experimental results of the stochastic Coulomb interaction in ion projection lithography
de Jager PWH, Derksen G, Mertens B, Cekan E, Lammer G, Vonach H, Buschbeck H, Zeininger M, Horner C, Loschner H, Stengl G, Bleeker AJ, Benschop J, Shi F, Volland B, Hudek P, Heerlein H, Rangelow IW, Kaesmaier R
Journal of Vacuum Science & Technology B, 17(6), 3098, 1999
2 p-n junction-based wafer flow process for stencil mask fabrication
Rangelow IW, Shi F, Volland B, Sossna E, Petrashenko A, Hudek P, Sunyk R, Butschke J, Letzkus F, Springer R, Ehrmann A, Gross G, Kaesmaier R, Oelmann A, Struck T, Unger G, Chalupka A, Haugeneder E, Lammer G, Loschner H, Tejeda R, Lovell E, Engelstad R
Journal of Vacuum Science & Technology B, 16(6), 3592, 1998
3 Optimization of the temperature distribution across stencil mask membranes under ion beam exposure
Kim B, Engelstad R, Lovell E, Chalupka A, Haugeneder E, Lammer G, Loschner H, Lutz J, Stengl G
Journal of Vacuum Science & Technology B, 16(6), 3602, 1998
4 Stochastic Coulomb interactions in ion projection lithography systems with aberration-broadened crossover
Kruit P, Barth JE, Lammer G, Chalupka A, Vonach H, Loschner H, Stengl G
Journal of Vacuum Science & Technology B, 15(6), 2369, 1997
5 Novel Electrostatic Column for Ion Projection Lithography
Chalupka A, Stengl G, Buschbeck H, Lammer G, Vonach H, Fischer R, Hammel E, Loschner H, Nowak R, Wolf P, Finkelstein W, Hill RW, Berry IL, Harriott LR, Melngailis J, Randall JN, Wolfe JC, Stroh H, Wollnik H, Mondelli AA, Petillo JJ, Leung K
Journal of Vacuum Science & Technology B, 12(6), 3513, 1994
6 Experimental Investigation of Stochastic Space-Charge Effects on Pattern Resolution in Ion Projection Lithography Systems
Hammel E, Chalupka A, Fegerl J, Fischer R, Lammer G, Loschner H, Malek L, Nowak R, Stengl G, Vonach H, Wolf P, Brunger WH, Buchmann LM, Torkler M, Cekan E, Fallmann W, Paschke F, Stangl G, Thalinger F, Berry IL, Harriott LR, Finkelstein W, Hill RW
Journal of Vacuum Science & Technology B, 12(6), 3533, 1994
7 Projection Ion-Beam Lithography
Loschner H, Stengl G, Chalupka A, Fegerl J, Fischer R, Hammel E, Lammer G, Malek L, Nowak R, Traher C, Vonach H, Wolf P, Hill RW
Journal of Vacuum Science & Technology B, 11(6), 2409, 1993