화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Crystallinity of Electrically Scaled Atomic Layer Deposited HfO2 from a Cyclical Deposition and Annealing Scheme
Consiglio S, Clark RD, Bersch E, LaRose JD, Wells I, Tapily K, Leusink GJ, Diebold AC
Journal of the Electrochemical Society, 159(6), G80, 2012
2 Extension of Far UV spectroscopic ellipsometry studies of High-kappa dielectric films to 130 nm
Kamineni VK, Hilfiker JN, Freeouf JL, Consiglio S, Clark R, Leusink GJ, Diebold AC
Thin Solid Films, 519(9), 2894, 2011
3 The Hydrogen Reduction of Wf6 - A Kinetic-Study Based on in-Situ Partial-Pressure Measurements
Oosterlaken TG, Leusink GJ, Janssen GC, Radelaar S
Journal of the Electrochemical Society, 143(5), 1668, 1996
4 The Effect of Doping Atoms on the Kinetics of Self-Limiting Tungsten Film Growth on Silicon by Reduction of Tungsten Hexafluoride
Vanderjeugd CA, Leusink GJ, Oosterlaken TG, Jongste JF, Janssen GC, Radelaar S
Journal of the Electrochemical Society, 142(4), 1326, 1995