검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Boron ultrashallow junction formation in silicon by low-energy implantation and rapid thermal annealing in inert and oxidizing ambient Lerch W, Gluck M, Stolwijk NA, Walk H, Schafer M, Marcus SD, Downey DF, Chow JW Journal of the Electrochemical Society, 146(7), 2670, 1999 |
| 2 |
Characterization of Low-Pressure Chemically Vapor-Deposited Tungsten Nitride Films Marcus SD, Foster RF Thin Solid Films, 236(1-2), 330, 1993 |