검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Spatial profile monitoring of etch products of silicon in HBr/Cl-2/O-2/Ar plasma Tanaka J, Miya G Journal of Vacuum Science & Technology A, 25(2), 353, 2007 |
| 2 |
Controlling gate-CD uniformity by means of a CD prediction model and wafer-temperature distribution control Kanno S, Miya G, Tanaka J, Masuda T, Kuwahara K, Sakaguchi M, Makino A, Tsubone T, Fujii T Thin Solid Films, 515(12), 4941, 2007 |