검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapse (vol 18, pg 3313, 2000) Goldfarb DL, de Pablo JJ, Nealey PF, Simons JP, Moreau WM, Angelopoulos M Journal of Vacuum Science & Technology B, 19(2), 600, 2001 |
| 2 |
Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapse Goldfarb DL, de Pablo JJ, Nealey PF, Simons JP, Moreau WM, Angelopoulos M Journal of Vacuum Science & Technology B, 18(6), 3313, 2000 |