| 1 |
Thin film properties by facing targets sputtering system
Kim KH, Son IH, Song KB, Kong SH, Keum MJ, Nakagawa S, Naoe M
Applied Surface Science, 169, 410, 2001 |
| 2 |
Effect of surface roughness on magnetic properties of Fe films deposited by dual ion beam sputtering
Iwatsubo S, Takahashi T, Naoe M
Thin Solid Films, 343-344, 67, 1999 |
| 3 |
An estimation of optimum Ar ion bombardment energy for good Fe films applying thermal spike effect
Iwatsubo S, Takahashi T, Naoe M
Thin Solid Films, 343-344, 71, 1999 |
| 4 |
Adhesive characteristics of Fe films deposited by ion beam sputtering with Ar ion bombardment
Iwatsubo S, Takahashi T, Naoe M
Thin Solid Films, 343-344, 261, 1999 |
| 5 |
The Enhancement of Plasma Confining Effect at Low Gas-Pressure in the Sputtering Apparatus with Floating Potential Cathode
Takahashi T, Iwatubo S, Asada M, Naoe M
Thin Solid Films, 281-282, 162, 1996 |
| 6 |
Effects of Magnet Behind the Target on Discharge and Sputtering Characteristics in the Sputtering Apparatus
Takahashi T, Iwatubo S, Asada M, Naoe M
Thin Solid Films, 281-282, 166, 1996 |
| 7 |
Magnetic and Structural-Properties of Fe Films Deposited by Ion-Beam Sputtering with a High-Energy Assisted Process
Iwatsubo S, Takahashi T, Naoe M
Thin Solid Films, 281-282, 484, 1996 |
