화학공학소재연구정보센터
검색결과 : 20건
No. Article
1 Lithographic imaging techniques for the formation of nanoscopic features
Wallraff GM, Hinsberg WD
Chemical Reviews, 99(7), 1801, 1999
2 Extreme ultraviolet emission of laser-produced plasmas using a cryogenic xenon target
Schriever G, Bergmann K, Lebert R
Journal of Vacuum Science & Technology B, 17(5), 2058, 1999
3 Characteristics of ion beams from a Penning source for focused ion beam applications
Guharay SK, Sokolovsky E, Orloff J
Journal of Vacuum Science & Technology B, 17(6), 2779, 1999
4 Proximity effect correction by the GHOST method using a scattering stencil mask
Yamashita H, Nomura E, Manako S, Kobinata H, Nakajima K, Nozue H
Journal of Vacuum Science & Technology B, 17(6), 2860, 1999
5 Demonstration of pattern transfer into sub-100 nm polysilicon line/space features patterned with extreme ultraviolet lithography
Cardinale GF, Henderson CC, Goldsmith JEM, Mangat PJS, Cobb J, Hector SD
Journal of Vacuum Science & Technology B, 17(6), 2970, 1999
6 High throughput electron lithography with the multiple aperture pixel by pixel enhancement of resolution concept
Kruit P
Journal of Vacuum Science & Technology B, 16(6), 3177, 1998
7 Pattern dependent alignment technique for mix-and-match electron-beam lithography with optical lithography
Gotoh Y, Sohda Y, Saitou N, Tawa T, Matsuzaka T, Asai N, Hayano K, Hasegawa N
Journal of Vacuum Science & Technology B, 16(6), 3202, 1998
8 Mask bias requirement for 0.13 mu m e-beam block exposure lithography
Takahashi K, Kanata H, Nara Y
Journal of Vacuum Science & Technology B, 16(6), 3279, 1998
9 Characteristics of focused beam spots using negative ion beams from a compact surface plasma source and merits for new applications
Guharay SK, Sokolovsky E, Orloff J
Journal of Vacuum Science & Technology B, 16(6), 3370, 1998
10 Fabrication and Analysis of Extreme-Ultraviolet Reflection Masks with Patterned W/C Absorber Bilayers
Voorma HJ, Louis E, Koster NB, Bijkerk F, Zijlstra T, Degroot LE, Rousseeuw BA, Romijn J, Vanderdrift EW, Friedrich J
Journal of Vacuum Science & Technology B, 15(2), 293, 1997