검색결과 : 20건
No. | Article |
---|---|
1 |
Lithographic imaging techniques for the formation of nanoscopic features Wallraff GM, Hinsberg WD Chemical Reviews, 99(7), 1801, 1999 |
2 |
Extreme ultraviolet emission of laser-produced plasmas using a cryogenic xenon target Schriever G, Bergmann K, Lebert R Journal of Vacuum Science & Technology B, 17(5), 2058, 1999 |
3 |
Characteristics of ion beams from a Penning source for focused ion beam applications Guharay SK, Sokolovsky E, Orloff J Journal of Vacuum Science & Technology B, 17(6), 2779, 1999 |
4 |
Proximity effect correction by the GHOST method using a scattering stencil mask Yamashita H, Nomura E, Manako S, Kobinata H, Nakajima K, Nozue H Journal of Vacuum Science & Technology B, 17(6), 2860, 1999 |
5 |
Demonstration of pattern transfer into sub-100 nm polysilicon line/space features patterned with extreme ultraviolet lithography Cardinale GF, Henderson CC, Goldsmith JEM, Mangat PJS, Cobb J, Hector SD Journal of Vacuum Science & Technology B, 17(6), 2970, 1999 |
6 |
High throughput electron lithography with the multiple aperture pixel by pixel enhancement of resolution concept Kruit P Journal of Vacuum Science & Technology B, 16(6), 3177, 1998 |
7 |
Pattern dependent alignment technique for mix-and-match electron-beam lithography with optical lithography Gotoh Y, Sohda Y, Saitou N, Tawa T, Matsuzaka T, Asai N, Hayano K, Hasegawa N Journal of Vacuum Science & Technology B, 16(6), 3202, 1998 |
8 |
Mask bias requirement for 0.13 mu m e-beam block exposure lithography Takahashi K, Kanata H, Nara Y Journal of Vacuum Science & Technology B, 16(6), 3279, 1998 |
9 |
Characteristics of focused beam spots using negative ion beams from a compact surface plasma source and merits for new applications Guharay SK, Sokolovsky E, Orloff J Journal of Vacuum Science & Technology B, 16(6), 3370, 1998 |
10 |
Fabrication and Analysis of Extreme-Ultraviolet Reflection Masks with Patterned W/C Absorber Bilayers Voorma HJ, Louis E, Koster NB, Bijkerk F, Zijlstra T, Degroot LE, Rousseeuw BA, Romijn J, Vanderdrift EW, Friedrich J Journal of Vacuum Science & Technology B, 15(2), 293, 1997 |