화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Liquid immersion lithography: Why, how, and when?
Rothschild M, Bloomstein TM, Kunz RR, Liberman V, Switkes M, Palmacci ST, Sedlacek JHC, Hardy D, Grenville A
Journal of Vacuum Science & Technology B, 22(6), 2877, 2004
2 Prospects for photolithography at 121 nm
Liberman V, Rothschild M, Murphy PG, Palmacci ST
Journal of Vacuum Science & Technology B, 20(6), 2567, 2002
3 Critical issues in 157 nm lithography
Bloomstein TM, Rothschild M, Kunz RR, Hardy DE, Goodman RB, Palmacci ST
Journal of Vacuum Science & Technology B, 16(6), 3154, 1998
4 Lithography with 157 nm lasers
Bloomstein TM, Horn MW, Rothschild M, Kunz RR, Palmacci ST, Goodman RB
Journal of Vacuum Science & Technology B, 15(6), 2112, 1997
5 3-Dimensional Laser Direct Writing - Applications to Multichip Modules
Nassuphis N, Mathews RH, Palmacci ST, Ehrlich DJ
Journal of Vacuum Science & Technology B, 12(6), 3294, 1994