검색결과 : 5건
No. | Article |
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1 |
Liquid immersion lithography: Why, how, and when? Rothschild M, Bloomstein TM, Kunz RR, Liberman V, Switkes M, Palmacci ST, Sedlacek JHC, Hardy D, Grenville A Journal of Vacuum Science & Technology B, 22(6), 2877, 2004 |
2 |
Prospects for photolithography at 121 nm Liberman V, Rothschild M, Murphy PG, Palmacci ST Journal of Vacuum Science & Technology B, 20(6), 2567, 2002 |
3 |
Critical issues in 157 nm lithography Bloomstein TM, Rothschild M, Kunz RR, Hardy DE, Goodman RB, Palmacci ST Journal of Vacuum Science & Technology B, 16(6), 3154, 1998 |
4 |
Lithography with 157 nm lasers Bloomstein TM, Horn MW, Rothschild M, Kunz RR, Palmacci ST, Goodman RB Journal of Vacuum Science & Technology B, 15(6), 2112, 1997 |
5 |
3-Dimensional Laser Direct Writing - Applications to Multichip Modules Nassuphis N, Mathews RH, Palmacci ST, Ehrlich DJ Journal of Vacuum Science & Technology B, 12(6), 3294, 1994 |