화학공학소재연구정보센터
검색결과 : 18건
No. Article
1 Mobility extraction for short channel UTBB-FDSOI MOSFETs under back bias using an accurate inversion charge density model
Trojman L, Ragnarsson LA, Collaert N
Solid-State Electronics, 154, 24, 2019
2 Submillimeter wave GaAs Schottky diode application based study and optimization for 0.1-1.5 THz
Jenabi S, Malekabadi A, Deslandes D, Boone F, Charlebois SA
Solid-State Electronics, 134, 65, 2017
3 Investigation and analysis of dual-k spacer with different materials and spacer lengths for nanowire-FET performance
Ko H, Kim J, Kang M, Shin H
Solid-State Electronics, 136, 68, 2017
4 Improvement of RF performance for AlGaN/GaN HEMT by using a cavity structure
Wang W, Yu XX, Zhou JJ, Chen DJ, Zhang K, Kong C, Lu HY, Kong YC, Li ZH, Chen TS
Solid-State Electronics, 126, 32, 2016
5 Capacitance estimation for In As Tunnel FETs by means of full-quantum k . p simulation
Gnani E, Baravelli E, Gnudi A, Reggiani S, Baccarani G
Solid-State Electronics, 108, 104, 2015
6 A 2-D semi-analytical model of parasitic capacitances for MOSFETs with high k gate dielectric in short channel
Wang M, Ke DM, Xu CX, Wang BT
Solid-State Electronics, 92, 35, 2014
7 Extra-low parasitic gate-to-contacts capacitance architecture for sub-14 nm transistor nodes
Niebojewski H, Le Royer C, Morand Y, Rozeau O, Jaud MA, Dubois E, Poiroux T, Bensahel D
Solid-State Electronics, 97, 45, 2014
8 Parasitic capacitance removal of sub-100 nm p-MOSFETs using capacitance-voltage measurements
Steinke DR, Piccirillo J, Gausepohl SC, Vivekand S, Rodgers MP, Lee JU
Solid-State Electronics, 68, 51, 2012
9 Anisotropic high-k deposition for gate-last processing of metal-oxide-semiconductor field-effect transistor utilizing electron-cyclotron-resonance plasma sputtering
Kikuchi Y, Gao J, Sano T, Ohmi S
Thin Solid Films, 520(7), 2989, 2012
10 Benchmarking SOI and bulk FinFET alternatives for PLANAR CMOS scaling succession
Chiarella T, Witters L, Mercha A, Kerner C, Rakowski M, Ortolland C, Ragnarsson LA, Parvais B, De Keersgieter A, Kubicek S, Redolfi A, Vrancken C, Brus S, Lauwers A, Absil P, Biesemans S, Hoffmann T
Solid-State Electronics, 54(9), 855, 2010