화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 Fabrication of self-aligned silicon field emission devices and effects of surface passivation on emission current
Rakhshandehroo MR, Pang SW
Journal of Vacuum Science & Technology B, 16(2), 765, 1998
2 Dry etching of Si field emitters and high aspect ratio resonators using an inductively coupled plasma source
Rakhshandehroo MR, Weigold JW, Tian WC, Pang SW
Journal of Vacuum Science & Technology B, 16(5), 2849, 1998
3 Field emission from gated Si emitter tips with precise gate tip spacing, gate diameter, tip sharpness, and tip protrusion
Rakhshandehroo MR, Pang SW
Journal of Vacuum Science & Technology B, 15(6), 2777, 1997
4 Simulation and Dry-Etching of Field Emitter Tips in Si
Rakhshandehroo MR, Sukardi F, Pang SW
Journal of Vacuum Science & Technology A, 14(3), 1832, 1996
5 Fabrication of Si Field Emitters by Dry-Etching and Mask Erosion
Rakhshandehroo MR, Pang SW
Journal of Vacuum Science & Technology B, 14(2), 612, 1996
6 Sharpening Si Field Emitter Tips by Dry-Etching and Low-Temperature Plasma Oxidation
Rakhshandehroo MR, Pang SW
Journal of Vacuum Science & Technology B, 14(6), 3697, 1996