1 |
The effects of substrate self-biasing on the growth of Sn-catalysed silicon nanowires grown at low pressure Ball J, Mendis BG, Reehal HS Journal of Materials Science, 49(5), 2078, 2014 |
2 |
The influence of substrate orientation on the density of silicon nanowires grown on multicrystalline and single crystal substrates by electron cyclotron resonance chemical vapour deposition Ball J, Reehal HS Thin Solid Films, 520(7), 2467, 2012 |
3 |
Influence of localized surface plasmon excitation in silver nanoparticles on the performance of silicon solar cells Temple TL, Mahanama GDK, Reehal HS, Bagnall DM Solar Energy Materials and Solar Cells, 93(11), 1978, 2009 |
4 |
Large-grained polycrystalline silicon films on glass by argon-assisted ECRCVD epitaxial thickening of seed layers Ekanayake G, Quinn T, Reehal HS, Rau B, Gall S Journal of Crystal Growth, 299(2), 309, 2007 |
5 |
A simple model explaining the preferential (100) orientation of silicon thin films made by aluminum-induced layer exchange Schneider J, Sarikov A, Klein J, Muske M, Sieber I, Quinn T, Reehal HS, Gall S, Fuhs W Journal of Crystal Growth, 287(2), 423, 2006 |
6 |
Large-grained poly-silicon thin films by aluminium-induced crystallisation of microcrystalline silicon Ekanayake G, Quinn T, Reehal HS Journal of Crystal Growth, 293(2), 351, 2006 |
7 |
Bonding structure and hydrogen content in silicon nitride thin films deposited by the electron cyclotron resonance plasma method Martinez FL, Ruiz-Merino R, del Prado A, San Andres E, Martil I, Gonzalez-Diaz G, Jeynes C, Barradas NP, Wang L, Reehal HS Thin Solid Films, 459(1-2), 203, 2004 |
8 |
Structural analysis of nanocrystalline SiC thin films grown on silicon by ECR plasma CVD Toal SJ, Reehal HS, Webb SJ, Barradas NP, Jeynes C Thin Solid Films, 343-344, 292, 1999 |
9 |
Low temperature growth of p-type crystalline silicon films by ECR plasma CVD Wang LC, Reehal HS Thin Solid Films, 343-344, 571, 1999 |
10 |
Growth of Single-Crystal Si, Ge and SiGe Layers Using Plasma-Assisted CVD Thwaites MJ, Reehal HS Thin Solid Films, 294(1-2), 76, 1997 |