화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 On the efficiency of stress techniques in gate-last n-type bulk FinFETs
Eneman G, Collaert N, Veloso A, De Keersgieter A, De Meyer K, Hoffmann TY, Horiguchi N, Thean A
Solid-State Electronics, 74, 19, 2012
2 Fabrication of Ge-channel MOSFETs by using replacement gate process and selective epitaxial growth
Terashima K, Tanabe A, Nakagawa T, Mori K, Ikarashi T, Nakatsuru J, Date H, Ikemoto M, Tatsumi T
Applied Surface Science, 254(19), 6165, 2008
3 The vertical replacement-gate (VRG) MOSFET
Hergenrother JM, Oh SH, Nigam T, Monroe D, Klemens FP, Kornblit A
Solid-State Electronics, 46(7), 939, 2002